Chip makers must choose lithography options now for 14-nm node, two generation away from the 28-nm node in wide production for today’s smallest devices. But it will not be until 2014 that extreme ultraviolet (EUV) lithography tools will be available for limited commercial use, said Luc van den Hove, chief executive of the IMEC research center in Belgium, speaking to EE Times after a keynote talk here.The cost of 14-nm wafers made with today’s 193-nm immersion lithography systems will be more than 90 percent greater than the cost of today’s 28-nm wafers. EUV would shave that increase to just under 60 percent, van den Hove estimated in his talk.
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