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June 17, 2011

Beneq Launches Roll-to-Roll atomic layer deposition System for Wide Flexible Substrates

Thin Film System TFS 200R for continuous mode ALD research (precursor to the WCS500)

Following the pioneering work in spatial atomic layer deposition and the launch of the revolutionizing research and development tool TFS 200R for continuous ALD in 2009, Beneq has closed the deal for a roll-to-roll ALD system, the Web Coating System WCS 500. The first WCS 500 unit will be delivered to the ASTRaL laboratory at Lappeenranta University of Technology (FIN).



Beneq CTO, Dr Tommi Vainio says: "The WCS 500 is a true roll-to-roll ALD platform, designed to enable scale-up from R and D to pilot manufacturing. With the WCS 500, we look to meet especially the growing need for high-quality moisture barriers in the flexible electronics industry. We believe there are multiple opportunities for a product that combines high ALD film quality with the productivity and cost of ownership of roll-to-roll manufacturing. WCS 500 accepts webs up to 500 mm in width ”.

Professor David Cameron, Director of ASTRaL says: “The WCS 500 tool will open up many new exciting research areas in thin film materials. The new system will allow us to build on our pioneering work on the continuous ALD process and to develop novel roll-to-roll applications where ALD has not been usable up till now.“

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