In mask patterning, the accuracy of the resolution and critical dimensions (CD) of the main circuit patterns are enhanced by application of a sub pattern, the Sub Resolution Assist Feature (SRAF), which modulates printed images of the main pattern. Optimization of SRAF placement is becoming increasingly difficult as lithographic exposure approaches its resolution limits. The new technology applies an adaptive search algorithm based on the optimal gradient method to optimize the placement of SRAF which improves positioning and CD accuracy by approximately 20%.
In order to overcome those weaknesses, Toshiba and AIST developed an adaptive search algorithm based on the optimal gradient method, in order to secure optimal SRAF placement. The new search algorithm carries out a local search, repeatedly seeking the best solution nearest to the current one, towards efficient achievement of an optimum solution. Application of the method enhances CD accuracy to 6nm, a 20% improvement. Used in combination with the interference map method the new technology achieves higher accuracy and higher efficiency than other methods.
Brian Wang is a Futurist Thought Leader and a popular Science blogger with 1 million readers per month. His blog Nextbigfuture.com is ranked #1 Science News Blog. It covers many disruptive technology and trends including Space, Robotics, Artificial Intelligence, Medicine, Anti-aging Biotechnology, and Nanotechnology.
Known for identifying cutting edge technologies, he is currently a Co-Founder of a startup and fundraiser for high potential early-stage companies. He is the Head of Research for Allocations for deep technology investments and an Angel Investor at Space Angels.
A frequent speaker at corporations, he has been a TEDx speaker, a Singularity University speaker and guest at numerous interviews for radio and podcasts. He is open to public speaking and advising engagements.
Toshiba and AIST Improve Lithography Masks to 6 Nanometer Accuracy
In mask patterning, the accuracy of the resolution and critical dimensions (CD) of the main circuit patterns are enhanced by application of a sub pattern, the Sub Resolution Assist Feature (SRAF), which modulates printed images of the main pattern. Optimization of SRAF placement is becoming increasingly difficult as lithographic exposure approaches its resolution limits. The new technology applies an adaptive search algorithm based on the optimal gradient method to optimize the placement of SRAF which improves positioning and CD accuracy by approximately 20%.
In order to overcome those weaknesses, Toshiba and AIST developed an adaptive search algorithm based on the optimal gradient method, in order to secure optimal SRAF placement. The new search algorithm carries out a local search, repeatedly seeking the best solution nearest to the current one, towards efficient achievement of an optimum solution. Application of the method enhances CD accuracy to 6nm, a 20% improvement. Used in combination with the interference map method the new technology achieves higher accuracy and higher efficiency than other methods.
Brian Wang is a Futurist Thought Leader and a popular Science blogger with 1 million readers per month. His blog Nextbigfuture.com is ranked #1 Science News Blog. It covers many disruptive technology and trends including Space, Robotics, Artificial Intelligence, Medicine, Anti-aging Biotechnology, and Nanotechnology.
Known for identifying cutting edge technologies, he is currently a Co-Founder of a startup and fundraiser for high potential early-stage companies. He is the Head of Research for Allocations for deep technology investments and an Angel Investor at Space Angels.
A frequent speaker at corporations, he has been a TEDx speaker, a Singularity University speaker and guest at numerous interviews for radio and podcasts. He is open to public speaking and advising engagements.
