Nanoimprint seems to be a viable plan B in case EUV stumbles.
It’s unclear if Toshiba will put nano-imprint tools into its production fabs at 22-nm and beyond. At this node, Toshiba is also exploring other lithography technologies, such as 193-nm immersion and extreme ultraviolet (EUV).
”Toshiba leveraged MII’s Imprio 250 system to pattern 18-nm isolated features and 24-nm dense features with
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