45 nanometer lithography processes are being introduced this year in 2007 (2nd half)
Intel has announced the shift to 45 nanometer for the second half of 2007 Details on IBM and AMDs work on their 45 nanometer process
The 32 nanometer process is scheduled for for 2009 by Intel
22 nanometer is expected about 2011
Recent successes overcoming nanoimprint problems could allow for an alternate approach to achieving 6 nanometers Nanoimprint lithography has a roadmap worked out to getting past the quality issues that it has
Metamaterials and superlenses could extend optical lithography down to the 2-6 nanometer range
New chip architectures such as crossbar could help boost chip processing power by 8 times
Past article from this site, advancednano, on AMD and Intels teraflop computer plans
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